The paper describes the oxidation of E110 alloy with Cr coatings in air atmosphere at 1100 °C for 20 min. The coatings were deposited using magnetron sputtering systems of the classical construction (with cooled targets in a dual configuration) and with a single hot target. The influence of magnetron type on energetic characteristics of the deposition and coating growth was described. The as-deposited and oxidized samples were analyzed by X-ray diffraction, scanning electron microscopy and glow discharge optical emission spectroscopy. The oxidation resistance of the Cr-coated alloy is strongly affected by microstructure and thickness of the deposited films. The Cr coatings obtained by hot target sputtering had a columnar microstructure, the mass gain of these samples was decreased from 9.18 to 3.22 mg/cm² with coating thickness from 1.8 to 4.5 μm. The minimal mass gain (2.86 mg/cm²) and the best protective properties were belong to the Cr coating with a dense microstructure and thickness of 3.1 μm that was deposited by dual magnetron sputtering. The adhesion behavior of Cr-coated Zr alloy strongly depends on oxidation states of Cr coating and Zr substrate as well as interface reactions.

这篇论文描述了在1100°C的空气中20分钟氧化E110合金与Cr涂层的过程。使用经典构造的磁控溅射系统（冷却靶材为双重配置）和单个热靶材来沉积涂层。描述了磁控管类型对沉积的能量特征和涂层生长的影响。通过X射线衍射，扫描电子显微镜和辉光放电光发射光谱法分析沉积和氧化的样品。镀铬合金的抗氧化性受到沉积膜的微观结构和厚度的强烈影响。通过热靶溅射获得的Cr涂层具有柱状微观结构，这些样品的质量增益从9.18降低到3.22 mg / cm ^2。涂层厚度为1.8至4.5μm。最小的质量增益（2.86 mg / cm ²）和最佳的保护性能属于具有双磁控溅射沉积的Cr涂层，该涂层具有致密的微观结构和3.1μm的厚度。Cr涂层Zr合金的粘附行为在很大程度上取决于Cr涂层和Zr基材的氧化态以及界面反应。