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Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition
ChemPlusChem ( IF 3.4 ) Pub Date : 2020-03-13 , DOI: 10.1002/cplu.202000108
Jaroslav Charvot 1 , Daniel Pokorný 1 , Raul Zazpe 2, 3 , Richard Krumpolec 4 , David Pavliňák 4 , Luděk Hromádko 2, 3 , Jan Přikryl 2 , Jhonatan Rodriguez‐Pereira 2 , Milan Klikar 1 , Veronika Jelínková 5 , Jan M. Macak 2, 3 , Filip Bureš 1
Affiliation  

Three cyclic silylselenides were prepared in a straightforward manner. Property tuning has been achieved by varying the ring size and the number of embedded selenium atoms. All silylselenides possess improved resistance towards moisture and oxidation as well as high thermal robustness and sufficient volatility with almost zero residues. Especially the six‐membered diselenide proved to be superior Se precursors for atomic layer deposition and allowed facile preparation of MoSe 2 layers. Their structure and composition has been investigated by Raman and X‐ray photoelectron spectroscopy as well as scanning electron microscopy revealing vertically aligned flaky shaped nanosheets.

中文翻译:

环状甲硅烷基硒化物:用于原子层沉积的便捷硒前体

以简单的方式制备了三种环状甲硅烷基硒化物。通过改变环的大小和嵌入的硒原子数可以实现性能调节。所有的甲硅烷基硒化物都具有提高的耐湿性和抗氧化性,以及高的耐热性和足够的挥发性,几乎零残留。尤其是六元二硒化物被证明是用于原子层沉积的优良Se前驱物,并且可以轻松制备MoSe 2层。它们的结构和组成已通过拉曼光谱和X射线光电子能谱以及扫描电子显微镜进行了研究,揭示了垂直排列的薄片状纳米片。
更新日期:2020-03-16
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