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Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputtering
Materials & Design ( IF 8.4 ) Pub Date : 2020-06-01 , DOI: 10.1016/j.matdes.2020.108634
B. Wicher , K. Zdunek , R. Chodun , S. Haj Ibrahim , M. Kubiś , A. Lachowski , K. Król , J. Jaroszewicz , R. Minikayev , K. Nowakowska-Langier

Abstract A three-dimensional (3D) sintering method of bulk magnetron targets has been developed recently. However, the use of bulk target had the following limitations: constrained geometry, limited chemical-phase composition, small size and cost-effectiveness. Thus a novel approach of surface sintering (2D) was arranged by a method of electromagnetic discharge evolution without applying any mechanical press. In the proposed method, the internal energy of pulsed plasma flux (~102.3 J) was dissipated at a tungsten (W) powder interface, therefore providing a form of sintered body with a density of 9.24–14.21 g/cm3 in the crystal structure of (α)-W. The morphology view indicates that, for the most part of sinters, only a subsurface (

中文翻译:

电磁放电钨粉靶材表面烧结:磁控溅射薄膜合成新方法

摘要 最近开发了一种体磁控靶的三维(3D)烧结方法。然而,块状靶材的使用具有以下局限性:几何形状受限、化学相组成有限、尺寸小且成本效益高。因此,通过电磁放电演化的方法安排了一种新的表面烧结 (2D) 方法,而无需施加任何机械压力。在所提出的方法中,脉冲等离子体通量 (~102.3 J) 的内能在钨 (W) 粉末界面耗散,因此提供了一种密度为 9.24–14.21 g/cm3 的烧结体形式,其晶体结构为(α)-W。形态学视图表明,对于大部分烧结矿,只有次表面 (
更新日期:2020-06-01
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