A cost‐effective, flexible, and transparent gas barrier has been a main pursuit of research into plastics electronics. However, it is difficult to realize a high‐performance gas barrier on a plastic substrate via a solution process at low temperature. Here, by introducing an interfacial photocatalytic reduction between TiO_x and graphene oxide (GO) films, a solution‐processed and transparent gas barrier film is demonstrated using reduced GO (rGO)/TiO_x. A dramatic photochemical reduction of GO occurs at the interface between TiO_x and the GO film under ultraviolet irradiation, which allows the fabrication of dense and uniform gas barrier films via a solution process at temperatures below 100 °C. In addition, the closely packed structure in the rGO film results in a decreased water vapor transmission rate (WVTR) of 0.37 g m⁻² day⁻¹ even with a thin rGO (<13 nm)/TiO_x (7 nm) film, leading to a high transmittance of over 80% in the visible range.

中文翻译：

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通过界面光催化还原进行固溶处理的透明氧化石墨烯/ TiOx阻气层

具有成本效益，灵活且透明的阻气层一直是塑料电子学研究的主要追求。但是，通过低温固溶工艺很难在塑料基板上实现高性能的阻气层。在这里，通过在TiO _x和氧化石墨烯（GO）膜之间引入界面光催化还原，使用还原的GO（rGO）/ TiO _x展示了溶液处理的透明阻气膜。TiO _x之间的界面处发生了GO的显着光化学还原以及在紫外线照射下的GO薄膜，可以在低于100°C的温度下通过固溶工艺制造致密且均匀的阻气薄膜。此外，即使薄的rGO（<13 nm）/ TiO _x（7 nm）薄膜，rGO膜中紧密堆积的结构也会导致水蒸气透过率（WVTR）降低0.37 g m ^-2天^-1，导致在可见光范围内的透射率高达80％以上。