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Tertiary Amine and Tooth Mineral Hydroxyapatite Facilely Trigger Self-cure of 10-MDP Based Adhesives
International Journal of Adhesion and Adhesives ( IF 3.4 ) Pub Date : 2019-07-01 , DOI: 10.1016/j.ijadhadh.2019.04.011
Hang Liu 1 , Yong Wang 1
Affiliation  

The present work aims to investigate if a novel self-cure system, mediated by tertiary amine ethyl 4-(dimethylamino)-benzoate (4E) and tooth mineral hydroxyapatite (HAp), would trigger polymerization of model adhesives based on a popular self-etch monomer, 10- methacryloyloxydecyl dihydrogen phosphate (10-MDP). The effect of 4E and HAp contents on degree of conversion (DC), polymerization rate (Rp), and induction period (IP) was investigated. The occurrence of such self-cure phenomenon in adhesives that underwent prior inadequate light cure was also evaluated. Model self-etch adhesives were prepared by using a monomer mixture of 10-MDP with 2-hydroxyethyl methacrylate at1:1 wt. ratio. 4E (0.3-1.3 wt%), and HAp (0.5-2 wt%) were added to the mixture. Benzoylperoxide and N,N-dihydroxyethyl-p-toluidine were used as conventional chemical-cure system, and trimethylbenzoyl-diphenylphosphine oxide as light-curing photoinitiator. The polymerization processes and mechanical properties of model adhesives were evaluated by real time ATR/FT-IR and nanoindentation, respectively. The 4E- HAp system successfully triggered self-cure of 10-MDP based model adhesives. DC, Rp and IP were apparently affected by both 4E and HAp contents. DC of self-cure of the model adhesives was much higher than that of the conventional chemical-cure system. 4E-HAp initiated self-cure further boosted DC to ~100% regardless of prior light exposure, and significantly improved elastic modulus and hardness, thus provided a novel polymerization method to effectively salvage curing of the adhesives after inadequate light-cure.

中文翻译:

叔胺和牙矿物羟基磷灰石轻松触发10-MDP基胶粘剂的自固化

本工作旨在研究由叔胺 4-(二甲氨基)-苯甲酸乙酯 (4E) 和牙齿矿物羟基磷灰石 (HAp) 介导的新型自固化系统是否会引发基于流行的自蚀刻的模型粘合剂的聚合单体,10-甲基丙烯酰氧癸基磷酸二氢酯(10-MDP)。研究了 4E 和 HAp 含量对转化率 (DC)、聚合速率 (Rp) 和诱导期 (IP) 的影响。还评估了在先前未充分光固化的粘合剂中发生这种自固化现象。模型自蚀刻粘合剂是通过使用 10-MDP 与 2-羟乙基甲基丙烯酸酯的单体混合物以 1:1 的重量制备的。比率。将4E(0.3-1.3wt%)和HAp(0.5-2wt%)加入混合物中。过氧化苯甲酰和 N,N-二羟乙基-对甲苯胺用作常规化学固化体系,三甲基苯甲酰基-二苯基氧化膦作为光固化光引发剂。模型粘合剂的聚合过程和力学性能分别通过实时 ATR/FT-IR 和纳米压痕进行评估。4E-HAp 系统成功触发了基于 10-MDP 的模型粘合剂的自固化。DC、Rp 和 IP 显然受 4E 和 Hap 含量的影响。模型粘合剂的自固化 DC 远高于传统的化学固化体系。4E-HAp 引发的自固化进一步将 DC 提高到~100%,无论先前的光照如何,并显着提高弹性模量和硬度,从而提供了一种新的聚合方法,可有效挽救光固化不足后粘合剂的固化。模型粘合剂的聚合过程和力学性能分别通过实时 ATR/FT-IR 和纳米压痕进行评估。4E-HAp 系统成功触发了基于 10-MDP 的模型粘合剂的自固化。DC、Rp 和 IP 显然受 4E 和 Hap 含量的影响。模型粘合剂的自固化 DC 远高于传统的化学固化体系。4E-HAp 引发的自固化进一步将 DC 提高到~100%,无论先前的光照如何,并显着提高弹性模量和硬度,从而提供了一种新的聚合方法,可有效挽救光固化不足后粘合剂的固化。模型粘合剂的聚合过程和力学性能分别通过实时 ATR/FT-IR 和纳米压痕进行评估。4E-HAp 系统成功触发了基于 10-MDP 的模型粘合剂的自固化。DC、Rp 和 IP 显然受 4E 和 Hap 含量的影响。模型粘合剂的自固化 DC 远高于传统的化学固化体系。4E-HAp 引发的自固化进一步将 DC 提高到~100%,无论先前的光照如何,并显着提高弹性模量和硬度,从而提供了一种新的聚合方法,可有效挽救光固化不足后粘合剂的固化。4E-HAp 系统成功触发了基于 10-MDP 的模型粘合剂的自固化。DC、Rp 和 IP 显然受 4E 和 Hap 含量的影响。模型粘合剂的自固化 DC 远高于传统的化学固化体系。4E-HAp 引发的自固化进一步将 DC 提高到~100%,无论先前的光照如何,并显着提高弹性模量和硬度,从而提供了一种新的聚合方法,可有效挽救光固化不足后粘合剂的固化。4E-HAp 系统成功触发了基于 10-MDP 的模型粘合剂的自固化。DC、Rp 和 IP 显然受 4E 和 Hap 含量的影响。模型粘合剂的自固化 DC 远高于传统的化学固化体系。4E-HAp 引发的自固化进一步将 DC 提高到~100%,无论先前的光照如何,并显着提高弹性模量和硬度,从而提供了一种新的聚合方法,可有效挽救光固化不足后粘合剂的固化。
更新日期:2019-07-01
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