Ion source development over the last 20 years at the IMP is reviewed. For versatile purposes, several types of ion sources have been involved in the research and development work at the IMP, i.e., the highly charged ECR (Electron Cyclotron Resonance) ion source, intense microwave ion source or the 2.45 GHz intense beam ECR ion source, and laser ion source (LIS). In the development of ECR ion sources, SECRAL (Superconducting ECR ion source with Advanced design in Lanzhou), Lanzhou ECR ion source, and Lanzhou all permanent magnet ECR ion source series have been made, which can cover the operation microwave frequency range of 10-28 GHz. The LIS with an Nd:YAG laser with a maximum output energy of 8 J in 8 ns pulse duration has been developed for very intense short pulse ion beams from solid materials such as C, Ti, Ni, Ag, and so on. Microwave ion sources have been built to produce intense pulsed or direct current beams from several mA to 100 mA for either high intensity accelerators or applications. This paper will give an overview of the high intensity ion source development at the IMP, especially on the recent progress and new results, such as the status of the fourth generation ECR ion source (first fourth generation ECR ion source), the production of recorded highly charged ion beams with SECRAL sources, key technology research studies, and so on.

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IMP 近 20 年高强度离子源发展概况

回顾了 IMP 过去 20 年的离子源开发。出于通用目的，IMP 的研发工作涉及多种类型的离子源，即高电荷 ECR（电子回旋共振）离子源、强微波离子源或 2.45 GHz 强束 ECR 离子源，和激光离子源 (LIS)。在ECR离子源的研制中，先后研制出SECRAL（兰州先进设计的超导ECR离子源）、兰州ECR离子源、兰州全永磁ECR离子源系列，可覆盖工作微波频率范围10- 28 GHz。带有 Nd:YAG 激光器的 LIS 在 8 ns 脉冲持续时间内的最大输出能量为 8 J，已开发用于来自固体材料（如 C、Ti、Ni、Ag 等）的非常强的短脉冲离子束。微波离子源可以产生从几毫安到 100 毫安的强脉冲或直流束，用于高强度加速器或应用。本文将概述 IMP 高强度离子源的发展，特别是最近的进展和新成果，例如第四代 ECR 离子源（第一第四代 ECR 离子源）的现状，记录的生产SECRAL 源的高电荷离子束、关键技术研究等。