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Analysis of electrodynamic conditions of photo-assisted nanoscale polishing of silica covered with calcium hypochlorite: theoretical analysis
Journal of Modern Optics ( IF 1.3 ) Pub Date : 2020-01-16 , DOI: 10.1080/09500340.2020.1713411
V. I. Kanevskii 1 , S. O. Kolienov 2
Affiliation  

ABSTRACT The light scattering by a rough quartz surface covered with a calcium hypochlorite solution is considered. It is shown that the optimal electric field can be formed over the quartz surface to provide its effective subnano-polishing when realizing next conditions: light falls on the surface under right angle, and the solution has a refractive index higher than that of quartz. Only in this case, the distribution of the electric field along quartz surface repeats the shape of surface profile and field energy in the peak region is greater than in the trough region, which creates optimal conditions for subnano-polishing.

中文翻译:

次氯酸钙包覆二氧化硅光辅助纳米抛光的电动条件分析:理论分析

摘要 考虑了覆盖有次氯酸钙溶液的粗糙石英表面的光散射。结果表明,当实现以下条件时,可以在石英表面上形成最佳电场以提供有效的亚纳米抛光:光以直角落在表面上,并且溶液的折射率高于石英的折射率。只有在这种情况下,沿石英表面的电场分布重复表面轮廓的形状,峰区的场能大于谷区,这为亚纳米抛光创造了最佳条件。
更新日期:2020-01-16
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