In this paper, the hysteresis behaviour of reactive magnetron sputtering process with oxygen admixture is studied by both experiment and model. The ground state number densities of titanium atoms and ions, and the deposition rates in high power impulse magnetron sputtering discharge were determined for a constant average applied power and pulse duration, while the repetition frequency and reactive gas supply were varied. The hysteresis curve reduced in width and shifted towards the lower oxygen supply with a decrease in the repetition frequency. These experimentally observed trends were well reproduced by a modified Berg model. The presented model utilised measured ionisation fraction of sputtered species and considered the back-attraction of the ionised sputtered species to the target. Significance of back-attraction process was observed as large fraction of ionised sputtered particles was found to be lost back to the target. This drastically decreased the number of particles deposited onto the substrate, which reduced not only the deposition rate, but also the gettering of the reactive gas. Consequently, the simulated hysteresis curve was shifted and reduced in width as it was observed experimentally.

中文翻译：

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溅射物质电离对含氧混合物的反应性 HiPIMS 滞后行为的影响

本文通过实验和模型相结合的方法研究了含氧反应磁控溅射工艺的磁滞行为。钛原子和离子的基态数密度以及高功率脉冲磁控管溅射放电中的沉积速率是在恒定的平均施加功率和脉冲持续时间下确定的，而重复频率和反应气体供应是变化的。滞后曲线的宽度减小并随着重复频率的降低而向较低的氧气供应移动。这些实验观察到的趋势被修改后的 Berg 模型很好地再现了。所提出的模型利用测量的溅射物质的电离分数并考虑电离的溅射物质对目标的反向吸引。观察到回吸过程的重要性，因为发现大部分电离的溅射粒子丢失回目标。这大大减少了沉积在基板上的颗粒数量，这不仅降低了沉积速率，而且还降低了反应气体的吸杂能力。因此，正如实验所观察到的那样，模拟的滞后曲线发生了偏移并减小了宽度。