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Realistic treatment for secondary electron emission in hybrid DC/DF capacitively coupled discharge
Plasma Sources Science and Technology ( IF 3.8 ) Pub Date : 2020-02-14 , DOI: 10.1088/1361-6595/ab6c80
Jing-Yu Sun , Quan-Zhi Zhang , Yong-Xin Liu , You-Nian Wang

Particle-in-cell/Monte Carlo collision simulations are performed to investigate the effects of using realistic models for secondary electron emission induced by different plasma species on the discharge characteristics in direct current (DC) superposed radio-frequency (RF) capacitively coupled plasmas (CCPs). A dual-frequency (DF, 60/2 MHz) source is applied on one of the electrodes to sustain the discharge, and an auxiliary DC source is fixed on the opposite electrode to generate energetic secondary electrons (SEs). Realistic models are employed to calculate the secondary electron yields (SEYs) induced by electrons and heavy particles (i.e. ions and fast neutrals) impacting the ‘dirty’ surfaces (e.g. oxidized metal), respectively, in argon discharge at a fixed pressure of 1.5 Pa. The results are compared to those obtained by assuming a constant ion-induced SEYs of γ = 0.1, and a constant elastic reflected electron yield of η el. = 0.2. As the effective ...

中文翻译:

混合DC / DF电容耦合放电中二次电子发射的现实处理

进行了单元内粒子/蒙特卡洛碰撞模拟,以研究使用现实模型对由不同等离子体物质诱发的二次电子发射对直流(DC)叠加射频(RF)电容耦合等离子体中的放电特性的影响( CCP)。在其中一个电极上施加双频(DF,60/2 MHz)源以维持放电,在对置电极上固定一个辅助DC源以生成高能二次电子(SEs)。使用逼真的模型来计算在固定压力为1.5 Pa的氩气放电中,电子和重粒子(即离子和快速中性粒子)分别撞击“脏”表面(例如,氧化的金属)所引起的二次电子产率(SEY)。 。将结果与假设γ= 0.1的恒定离子诱导SEY和ηel的恒定弹性反射电子产率进行比较。= 0.2。作为有效的...
更新日期:2020-02-14
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