Abstract Industry-scalable fabrication methods of sulfur-based transition metal dichalcogenides are being developed, which puts strong requirements on the characterization of these mono- and few-layer materials in a cleanroom environment. In this paper, we show that the stoichiometry of ultrathin molydbenum disulfide layers can be determined by inline X-ray photoemission spectroscopy and wavelength-dispersive X-ray fluorescence, within the uncertainty provided by reference-free X-ray fluorescence in grazing incidence performed at the Physikalisch-Technische Bundesanstalt. In addition, we demonstrate that automated inline wavelength-dispersive X-ray fluorescence analysis can accurately determine the mass deposition of molybdenum and sulfur. Such information is crucial to support and accelerate the development of multi-parametric sulfur-based transition metal dichalcogenides processes, for instance by careful adjustment of the mass deposition per deposition cycle, both on samples and full wafers.

中文翻译：

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使用 X 射线荧光和 X 射线光电子能谱在线表征超薄过渡金属二硫属化物

摘要 硫基过渡金属二硫属化物的工业可扩展制造方法正在开发中，这对在洁净室环境中表征这些单层和少层材料提出了强烈要求。在本文中，我们表明超薄二硫化钼层的化学计量可以通过在线 X 射线光发射光谱和波长色散 X 射线荧光确定，在由无参考 X 射线荧光提供的不确定度范围内进行的掠入射在德国物理学会。此外，我们证明自动在线波长色散 X 射线荧光分析可以准确地确定钼和硫的质量沉积。