Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr⁶⁺) and sulfuric acid (H₂SO₄). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance.

在此，通过在多种主要由六价铬（Cr ⁶⁺）和硫酸（H ₂ SO ₄）组成的Sargent浴中使用各种阳极电流时间通过脉冲反向（PR）电沉积成功地合成了铬膜。）。研究了电镀过程中阳极时间与各种物理性能之间的相关性。随着PR电镀阳极时间的增加，电沉积铬的裂纹密度，硬度和厚度降低。由于裂纹密度低，通过PR电镀制备的铬比通过直流（DC）电镀制备的铬具有更高的耐腐蚀性。因此，基于裂纹密度，硬度，电流效率和膜厚，发现PR电镀的最佳阳极时间为0.001 s。获得的结果表明，这种优化工艺是电镀具有低裂纹密度和高耐蚀性的铬膜的有前途的途径。