SnO₂:xZn thin films (x = 0, 1, 3, 5, 10, 15 wt%) were deposited onto a glass substrate by ultrasonic spray pyrolysis at 350°C and characterized by XRD, UV–VIS spectra, AFM imaging, and texture analysis. All deposited thin films exhibited preferential orientation along the (110) plane. The films were highly transparent (about 80%) in the visible. Upon an increase in x, the band gap energy of the films decreased from 3.7 eV to 3.3 eV.

中文翻译：

---

（110）平面织构SnO 2：Zn薄膜的结构和光学性质

SnO ₂：x Zn薄膜（x = 0、1、3、5、10、15 wt％）通过超声喷雾热解在350°C沉积在玻璃基板上，并通过XRD，UV-VIS光谱，AFM成像进行表征，以及纹理分析。所有沉积的薄膜均表现出沿（110）平面的优先取向。薄膜在可见光下是高度透明的（约80％）。随着x的增加，膜的带隙能量从3.7eV降低至3.3eV。