Abstract Field emission properties of well characterized thin films, prepared using hydrothermal method, have been analysed to propose a new set of parameters for quantification of electron emission quality. Hydrothermally grown Nanopetals and nanorods of NiO and TiO2 respectively show good field emission properties of course different from each other due to variation in microstructures. The proposed analytical method enables one to understand the field emission properties in better sense as compared to the traditionally used framework, namely the Fowler-Nordhiem approach. The proposed model improves the analysis by introducing a boost-factor to take care of the field emission data in totality unlike the traditional method where only currents for higher electric fields are considered. The proposed model is found to be more appropriate as it addresses the ambiguity present in the previously used method. A quantum mechanical approach has been adopted for explaining the improved field emission properties from these nanostructures using the concept of tunnelling probability.

中文翻译：

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用于量化纳米结构场发射的改进分析框架

摘要 对使用水热法制备的表征良好的薄膜的场发射特性进行了分析，以提出一套用于量化电子发射质量的新参数。水热生长的 NiO 和 TiO2 纳米花瓣和纳米棒分别表现出良好的场发射特性，当然由于微观结构的变化而彼此不同。与传统使用的框架（即 Fowler-Nordhiem 方法）相比，所提出的分析方法使人们能够更好地理解场发射特性。与仅考虑较高电场电流的传统方法不同，所提出的模型通过引入升压因子来全面处理场发射数据，从而改进了分析。发现所提出的模型更合适，因为它解决了先前使用的方法中存在的歧义。已经采用量子力学方法来解释使用隧道概率概念的这些纳米结构改进的场发射特性。