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Effects of precursor concentration on the microstructural, optical and photoelectrochemical properties of Bi2O3 films synthesized by sol-gel method
Optik ( IF 3.1 ) Pub Date : 2020-01-24 , DOI: 10.1016/j.ijleo.2020.164303
H. Baqiah , Z.A. Talib , J.Y.C. Liew , A.H. Shaari , Z. Zainal , Laimy M. F.

β-Bi2O3 films were prepared by sol-gel method process from solutions with different precursor concentration (M = 0.05–0.20). The films were characterized by X-rays diffractions (XRD), field emission electron microscopy (FESEM), atomic force microscopy (AFM), UV–vis spectroscopy, photoluminescence spectroscopy (PL), photoelectrochemical (PEC) and electrochemical impedance measurements. The Bi2O3 deposited film had single phase β-Bi2O3 on ITO substrate while it exhibited mixed phases of ε-, δ- and β-Bi2O3 on glass substrate. By increasing M above 0.05, more XRD patterns were observed and lattice parameter c increased. Besides, crystallite size of films increased first from 19.2 to 26.4 nm at M = 0.05 – 0.15 and then decreased to 19.4 nm at M = 0.20. From AFM, the films consisted of polyhedron-like shape islands with height and distribution increased with increment of M. The surface roughness increased from 10.3 to 18.5 nm for film with M = 0.05 and 0.15, respectively, and then decreased to 14.8 nm for film M = 0.20. Optical band gap decreased from 3.24 eV for film M = 0.05 to 2.89 eV for film M = 0.20. From PEC, photocurrent of films increased with increment of M and had maximum value 3.8 × 10−4 A/cm2 for film M = 0.20 at 0 V versus Ag/AgCl. Electrochemical impedance analysis showed a gradual reduction of charge transfer resistance with increasing M. Finally, β-Bi2O3 films with tailored microstructure were prepared which make it attractive for many applications.



中文翻译:

前驱体浓度对溶胶-凝胶法合成Bi 2 O 3薄膜的微观结构,光学和光电化学性质的影响

β-Bi系2个ö 3薄膜通过溶胶-凝胶法处理来自具有不同前体的浓度(溶液制备中号= 0.05-0.20)。薄膜的特征在于X射线衍射(XRD),场发射电子显微镜(FESEM),原子力显微镜(AFM),紫外可见光谱,光致发光光谱(PL),光电化学(PEC)和电化学阻抗测量。铋2 ö 3淀积膜具有单相β-Bi系2 ö 3 ITO基板上,同时它表现出ε-,δ-和β-Bi系的混合相2 ö 3的玻璃基板上。通过增加M高于0.05,观察到更多的XRD图并且晶格参数c增加。此外,薄膜的微晶尺寸首先在M = 0.05 – 0.15时从19.2 nm增加到26.4 nm,然后在M = 0.20时减小到19.4 nm 。根据原子力显微镜,薄膜由多面体形状的岛组成,高度和分布随着M的增加而增加。对于M= 0.05和0.15的膜,表面粗糙度分别从10.3nm增加到18.5nm ,然后对于M= 0.20的膜,表面粗糙度减小到14.8nm 。光学带隙从膜M = 0.05的3.24 eV降低到膜M = 0.20的2.89 eV 。从PEC看,薄膜的光电流随着中号和具有最大值3.8×10 -4 A /厘米2为膜中号= 0.20在0V与银/氯化银。电化学阻抗分析表明,随着M的增加,电荷转移电阻逐渐减小。最后,β-碧2层Ø 3制备薄膜量身定制的微结构,这使得它对于许多应用有吸引力。

更新日期:2020-01-24
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