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Edge-Terminated MoS2 Nanosheets with an Expanded Interlayer Spacing on Graphene to Boost Supercapacitive Performance
Chemical Engineering Journal ( IF 15.1 ) Pub Date : 2020-01-23 , DOI: 10.1016/j.cej.2020.124204
Huanhuan Sun , Huanyan Liu , Zhidong Hou , Rui Zhou , Xingrui Liu , Jian-Gan Wang

The supercapacitive performance of two-dimensional (2D) MoS2 nanomaterials strongly depends on the interlayer spacing and edge orientation, which remains a formidable challenge. Herein, we demonstrate a sheet-on-sheet 2D heterostructure with edge-terminated and interlayer-expanded MoS2 few-layered nanosheets on graphene. The preferential (002) edge orientation with an expanded interlayer spacing of 0.98 nm enables easy insertion of ions into the MoS2 nanosheets. The intimate connection with conductive graphene further expedites the electrochemical kinetics by promoting electron/ion transport and structural stability. As a result, the MoS2@graphene nanoarchitecture can deliver a high specific capacitance of 428 F g-1 at 1 A g-1 along with superior rate and long-term durability, which is among the best performance reported so far. The present work highlights the importance of engineering edge-oriented and interlayer-expanded 2D materials for their promising use toward high-performance supercapacitors.



中文翻译:

边缘端接的MoS 2 纳米片,在石墨烯上具有扩展的中间层间距,可提高超电容性能

二维(2D)MoS 2纳米材料的超电容性能在很大程度上取决于层间间距和边缘方向,这仍然是一个艰巨的挑战。在这里,我们演示了在石墨烯上具有边缘终止和层间扩展的MoS 2几层纳米片的片上片二维异质结构。具有扩展的0.98 nm的层间间距的优先(002)边缘方向使离子易于插入MoS 2纳米片中。与导电石墨烯的紧密连接通过促进电子/离子传输和结构稳定性进一步加快了电化学动力学。结果,MoS 2 @石墨烯纳米结构可以提供428 F g -1的高比电容在1 A g -1下具有优异的速率和长期耐用性,这是迄今为止报道的最佳性能之一。本工作强调了面向边缘和层间扩展2D材料的工程技术对于它们对高性能超级电容器的应用前景的重要性。

更新日期:2020-01-23
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