Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.

中文翻译：

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具有气相沉积超薄交联表面改性层的高x嵌段共聚物薄膜的高保真亚5纳米图案。

尽管它们具有能力，但是由于构成嵌段的巨大表面能差异，由强分离的嵌段共聚物（BCP）薄膜形成的亚10纳米周期性纳米图案无法轻易垂直于基板取向。为了产生垂直的纳米图案，应当精确地控制衬底和自由界面的界面能，以引起非优先润湿。不幸的是，高性能表面改性层的设计具有挑战性，必须分别为每个中性层和面漆设计不同种类的表面改性方法。此外，主要基于旋涂工艺的常规方法极易形成缺陷，并且很容易在低于10 nm的厚度下引起去湿。至今，这些障碍阻碍了高保真，低于5 nm的BCP图案的开发。本文中，通过全气相沉积法启动的化学气相沉积被证明可形成9纳米厚，均匀的中性底层和面漆，并能精确控制组成和厚度。这些层用于BCP薄膜中，以产生直径约为4 nm的垂直圆柱，这些圆柱在整个BCP厚度高达≈60 nm的范围内传播，对应于BCP的五个自然畴间距。这种稳健的方法将成为10纳米以下纳米图案可靠生成的进步。均匀的中性底层和面漆，具有对成分和厚度的精确控制。这些层用于BCP薄膜中，以产生直径约为4 nm的垂直圆柱，这些圆柱在整个BCP厚度高达≈60 nm的范围内传播，对应于BCP的五个自然畴间距。这种稳健的方法将成为10纳米以下纳米图案可靠生成的进步。均匀的中性底层和面漆，具有对成分和厚度的精确控制。这些层用于BCP薄膜中，以产生直径约为4 nm的垂直圆柱，这些圆柱在整个BCP厚度高达≈60 nm的范围内传播，对应于BCP的五个自然畴间距。这种稳健的方法将成为10纳米以下纳米图案可靠生成的进步。