Superhydrophobic coatings are a field of great interest due to its many applications, including corrosion protection. Such films have been increasingly produced by coupling sol–gel processing with electrodeposition of silane precursors for the sake of its simplicity, controllability, variety of precursors, low toxicity, and low cost. However, despite of the method’s sensitivity to process variables, current literature mostly reports univariate analysis, failing to provide their combined effect and relative importance on response variables. In order to fill this knowledge gap, this paper presents a screening design considering 11 independent variables, followed by a surface response design, to assess the water contact angle (WCA), film thickness, and impedance modulus of silane films electrodeposited onto carbon steel, under several conditions. Here, octyltriethoxysilane (OTES) was selected as one of the sol–gel precursors, since it presents a non-hydrolysable alkyl chain capable of providing low surface energy and consequently water repellence. Results pointed out pH and the ratio between the number of mols of OTES and tetraethoxysilane (TEOS) as key factors for achieving higher WCAs, while pH and the volumetric percentage of water in the deposition solution were the most relevant variables for film thickness. Improved deposition conditions led to WCAs and film thicknesses above 157° and 70 µm, respectively, while monitored impedance modulus at 0.01 Hz in NaCl 3.5 wt% solution were superior to 10⁶ Ohm cm², even after 48 h of immersion.

由于超疏水涂料的许多应用包括腐蚀防护，因此它是一个非常受关注的领域。由于其简单，可控性，前体种类繁多，毒性低和成本低廉，通过将溶胶-凝胶工艺与硅烷前体的电沉积相结合，已越来越多地生产此类薄膜。然而，尽管该方法对过程变量敏感，但目前的文献大多报道了单变量分析，未能提供其综合作用和对响应变量的相对重要性。为了填补这一知识空白，本文提出了一种筛选设计，其中考虑了11个独立变量，然后进行了表面响应设计，以评估电沉积在碳钢上的硅烷膜的水接触角（WCA），膜厚和阻抗模量，在几种情况下。在这里，辛基三乙氧基硅烷（OTES）被选作溶胶-凝胶前体之一，因为它具有能够提供低表面能并因此具有疏水性的不可水解的烷基链。结果指出，pH和OTES摩尔数与四乙氧基硅烷（TEOS）之间的比率是获得更高WCA的关键因素，而pH和沉积溶液中水的体积百分比是与膜厚度最相关的变量。改善的沉积条件导致WCA和膜厚度分别超过157°和70 µm，而在3.5 wt％的NaCl溶液中0.01 Hz的监测阻抗模量优于10 因为它具有能够提供低表面能并因此具有疏水性的不可水解的烷基链。结果指出，pH和OTES摩尔数与四乙氧基硅烷（TEOS）之间的比率是获得更高WCA的关键因素，而pH和沉积溶液中水的体积百分比是与膜厚度最相关的变量。改善的沉积条件导致WCA和膜厚度分别超过157°和70 µm，而在3.5 wt％的NaCl溶液中0.01 Hz的监测阻抗模量优于10 因为它具有能够提供低表面能并因此具有疏水性的不可水解的烷基链。结果指出，pH和OTES摩尔数与四乙氧基硅烷（TEOS）之间的比率是获得更高WCA的关键因素，而pH和沉积溶液中水的体积百分比是与膜厚度最相关的变量。改善的沉积条件导致WCA和膜厚度分别超过157°和70 µm，而在3.5 wt％的NaCl溶液中0.01 Hz的监测阻抗模量优于10 pH和沉积溶液中水的体积百分比是与膜厚最相关的变量。改善的沉积条件导致WCA和膜厚度分别超过157°和70 µm，而在3.5 wt％的NaCl溶液中0.01 Hz的监测阻抗模量优于10 pH和沉积溶液中水的体积百分比是与膜厚最相关的变量。改善的沉积条件导致WCA和膜厚度分别超过157°和70 µm，而在3.5 wt％的NaCl溶液中0.01 Hz的监测阻抗模量优于10甚至在浸入48 h后 仍为⁶ Ohm cm ²。