Ultrasonic mist vapor deposition (UMVD) is a widely used facile technique to prepare ZnO thin films. The surface properties of prepared thin films can be tuned via easily controllable UMVD deposition parameters. Herein, we utilized an oblique angle (OA) geometry in UMVD system named as OA-UMVD. The angle between incident flow and substrate ( θ s ) was changed from 0° to 45°. Alteration of θ s as well as substrate temperature ( T s ) resulted in the deposition of ZnO thin films with different morphologies. For mild nozzle–substrate distance ( D = 3 cm), fine vertical ZnO nanosheets with length of 123 nm and thickness of 23 nm were obtained for low T s (330 °C) and small θ s (≈ 0°). By increasing both T s and θ s , ZnO nanorods gradually appeared on the surface. Both nozzle–substrate distance ( D ) and T s showed similar effect on deposition rate ( R d ), and R d decreased by increase of D and T s , while deposition rate increased for larger θ s . Confocal microscopy results revealed that using low T s (330 °C), short distance ( D = 1.5 cm) and large θ s (45 ° ) resulted in high macroscopic surface roughness (MRs) of 98 nm, while high T s (500 °C), long D (5 cm) and small θ s (≈ 0 ○ ) created compact and smooth surface with low MRs of 5 nm, in accordance with transmittance results. The ZnO wurtzite crystal structure was approved via X-ray diffraction patterns. The crystallite size in the layers was affected only by T s , and θ s had no significant effect on the layers’ crystallinity. Obtaining different ZnO nanostructures with different MRs via easily and accurately controllable growth parameters is a great advantage for our employed OA-UMVD system, which could be used to prepare ZnO thin films with desired morphologies for widespread application fields.

中文翻译：

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通过斜角超声雾气相沉积 (OA-UMVD) 轻松制备 ZnO 纳米结构薄膜：系统研究

超声雾气相沉积 (UMVD) 是一种广泛使用的制备 ZnO 薄膜的简便技术。制备的薄膜的表面特性可以通过易于控制的 UMVD 沉积参数进行调整。在这里，我们在名为 OA-UMVD 的 UMVD 系统中使用了斜角 (OA) 几何。入射流和基板之间的角度 (θs) 从 0° 变为 45°。θ s 以及衬底温度（ T s ）的改变导致沉积具有不同形态的 ZnO 薄膜。对于温和的喷嘴 - 基板距离（ D = 3 cm），在低 T s （330°C）和小 θ s （≈0°）下获得长度为 123 nm 和厚度为 23 nm 的精细垂直 ZnO 纳米片。通过增加T s 和θ s ，ZnO纳米棒逐渐出现在表面上。喷嘴-基板距离（ D ）和 T s 对沉积速率（ R d ）表现出相似的影响，并且 R d 随着 D 和 T s 的增加而降低，而沉积速率随着更大的 θ s 增加。共聚焦显微镜结果显示，使用低 T s (330 °C)、短距离 (D = 1.5 cm) 和大 θ s (45°) 导致 98 nm 的高宏观表面粗糙度 (MR)，而高 T s (500 °C)、长 D (5 cm) 和小 θ s (≈ 0 ○ ) 产生紧凑光滑的表面，MR 低 5 nm，根据透射率结果。ZnO 纤锌矿晶体结构通过 X 射线衍射图得到证实。层中的微晶尺寸仅受 T s 影响，θ s 对层的结晶度没有显着影响。