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General and fast patterning of semiconductor nanocrystals by femtosecond laser direct writing
Journal of Physics D: Applied Physics ( IF 3.4 ) Pub Date : 2020-01-10 , DOI: 10.1088/1361-6463/ab6623
Yanan Liu 1, 2, 3 , Zhijun Luo 1, 2, 3 , Changsheng Xie 1, 2, 3 , Zongsong Gan 1, 2, 3
Affiliation  

Semiconductor nanocrystals have shown remarkable performance in the field of displays, solar cells, and photodetectors. But, a rapid method to produce localized stable nanocrystals remains a challenge, impeding the step toward device miniaturization. Here, we present a general and fast approach, femtosecond laser direct writing, for manufacturing these nanocrystals as well as integrating them into substrates in one step. The high peak power of the femtosecond laser induces a nonlinear absorption of the CatX (Cat = Cd or Pb, X = S, Se or Te) precursor at the focal spot. Once the temperature reaches the nucleation temperature, the CatX nanocrystals form immediately. By moving the displacement platform, arbitrary microscale patterns made of nanoscale crystals are obtained, which shows great potential in high-resolution displays and on-chip light sources.

中文翻译:

飞秒激光直接写入对半导体纳米晶体的常规和快速构图

半导体纳米晶体在显示器,太阳能电池和光电检测器领域已显示出非凡的性能。但是,快速产生局部稳定的纳米晶体的方法仍然是一个挑战,阻碍了器件小型化的步伐。在这里,我们提出了一种通用且快速的方法,即飞秒激光直接写入,用于制造这些纳米晶体并将它们集成到一个步骤中。飞秒激光的高峰值功率在焦点处引起CatX前体的非线性吸收(Cat = Cd或Pb,X = S,Se或Te)。温度达到成核温度后,CatX纳米晶体立即形成。通过移动位移平台,可以获得由纳米级晶体制成的任意微尺度图案,
更新日期:2020-01-11
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