Using a theory of X-ray diffraction moiré fringes developed in a previous paper, labelled Part I [Yoshimura (2015). Acta Cryst. A71, 368–381], the X-ray moiré images of a silicon bicrystal having a weak curvature strain and an interspacing gap, assumed to be integrated for an incident-wave angular width, are simulation-computed over a wide range of crystal thicknesses and incident-wave angular width, likely under practical experimental conditions. Along with the simulated moiré images, the graphs of characteristic quantities on the moiré images are presented for a full understanding of them. The treated moiré images are all of rotation moiré. Mo Kα1 radiation and the 220 reflection were assumed in the simulation. The results of this simulation show that fringe patterns, which are significantly modified from simple straight fringes of rotation moiré, appear in some ranges of crystal thicknesses and incident-wave angular width, due to a combined effect of Pendellösung oscillation and an added phase difference from the interspacing gap, under the presence of a curvature strain. The moiré fringes which slope to the perpendicular direction to the diffraction vector in spite of the assumed condition of rotation moiré, and fringe patterns where low-contrast bands are produced with a sharp bend of fringes arising along the bands are examples of the modified fringe pattern. This simulation study provides a wide theoretical survey of the type of bicrystal moiré image produced under a particular condition.

中文翻译：

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X射线衍射莫尔条纹特性的理论研究。二. 角度积分莫尔图像的图示

使用先前论文中开发的 X 射线衍射莫尔条纹理论，标记为第一部分 [Yoshimura (2015)。水晶学报。A71，368–381]，具有弱曲率应变和间隙的硅双晶的 X 射线莫尔图像（假定对入射波角宽度进行积分）在各种晶体厚度和范围内进行了模拟计算入射波角宽度，可能在实际实验条件下。与模拟莫尔图像一起，还提供了莫尔图像上的特征量图，以便充分理解它们。处理后的云纹图像均为旋转云纹。莫Kα1模拟中假设了辐射和 220 反射。该模拟的结果表明，由于以下因素的综合影响，在某些晶体厚度和入射波角宽度范围内，出现了与旋转莫尔条纹的简单直条纹相比发生显着变化的条纹图案。潘德洛松在存在曲率应变的情况下，振动和来自间隙的附加相位差。尽管假设旋转莫尔条纹的条件，但仍向与衍射矢量垂直的方向倾斜的莫尔条纹，以及产生低对比度带且沿带出现条纹急剧弯曲的条纹图案是修改的条纹图案的示例。这项模拟研究为特定条件下产生的双晶莫尔图像的类型提供了广泛的理论调查。