This letter reports on the fabrication, simulation, and characterization of conformal antireflective black-silicon (BSi) nanowires on a 3-D silicon structure. The BSi nanostructures were formed on various facets of a 3-D Si structure including sharp tips and sidewalls using a metal-assisted chemical etching process. The conformal BSi design was simulated using an finite-difference time-domain Lumerical software. The antireflection capability was indicated by the quantified reduction in normalized intensity after the image processing of diffraction patterns. An optical iris of 1.00-mm circular aperture with conformal BSi nanowires was fabricated and characterized to demonstrate the anti-reflectivity capability at two visible wavelengths of 532 and 633 nm. The iris showed a significant reduction in glare around its Airy disc, up to $3\times $ smaller than the same one but without the BSi nanostructures. [2017–0277]

中文翻译：

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在 3-D 硅结构上形成共形抗反射表面

这封信报告了 3-D 硅结构上共形抗反射黑硅 (BSi) 纳米线的制造、模拟和表征。BSi 纳米结构是使用金属辅助化学蚀刻工艺在 3-D Si 结构的各个面上形成的，包括尖锐的尖端和侧壁。共形 BSi 设计使用有限差分时域 Lumerical 软件进行模拟。抗反射能力由衍射图案图像处理后归一化强度的量化减少来表示。制造并表征了具有共形 BSi 纳米线的 1.00 毫米圆形孔径的光学虹膜，以证明其在 532 和 633 nm 的两个可见波长下的抗反射能力。虹膜在其艾里斑周围的眩光显着减少，比没有 BSi 纳米结构的同一个小高达 $3\times $。[2017–0277]