We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 μm diameter) are reactive-ion etched through the top SiO(2) and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.

中文翻译：

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空心反共振反射光波导中的微孔和纳米孔制造。

我们展示了在空心反共振反射光波导中制造微孔和纳米孔特征，以创建一个可以选择和检测单个纳米粒子的电学和光学分析平台。微孔（4 μm 直径）通过波导的顶部 SiO(2) 和 SiN 层进行反应离子蚀刻，在空芯上方留下薄的 SiN 膜。纳米孔是使用聚焦离子束蚀刻工艺在 SiN 膜中形成的，该工艺可控制孔径。创建直径小至 20 nm 的开口。光损耗测量表明微孔没有显着改变沿波导的损耗。