56079
当前位置: 首页   >  组内活动   >  Plasma-Enhanced Atomic Layer Deposition
Plasma-Enhanced Atomic Layer Deposition
发布时间:2019-10-14

Plasma-Enhanced Atomic Layer Deposition (Picosun R-200 Advanced)

  • Sources: Ti, Ga, Ni, Co, Mg
  • Plasma sources: O2, NH3
  • Substrate size: 6 inches, temperature: <500 °C