This international journal covers the application of control theory, operations research, computer science and engineering principles to the solution of process control problems. In addition to the traditional chemical processing and manufacturing applications, the scope of process control problems involves a wide range of applications that includes energy processes, nano-technology, systems biology, bio-medical engineering, pharmaceutical processing technology, energy storage and conversion, smart grid, and data analytics among others. 
Papers on the theory in these areas will also be accepted provided the theoretical contribution is aimed at the application and the development of process control techniques. 
Topics covered include: 
• Control applications • Process monitoring • Plant-wide control • Process control systems • Control techniques and algorithms • Process modelling and simulation • Design methods 
Advanced design methods exclude well established and widely studied traditional design techniques such as PID tuning and its many variants. Applications in fields such as control of automotive engines, machinery and robotics are not deemed suitable unless a clear motivation for the relevance to process control is provided. 

regular papers; brief papers; and review and tutorial papers (often by invitation only)

Editor-in-Chief
Denis Dochain
Center for Systems Engineering and Applied Mathematics, Avenue Georges Lemaître, 4, B 1348, Louvain-la-Neuve, Belgium Email Denis Dochain
Deputy Editor
M. Guay
Queen's University, Kingston, Ontario, Canada
Senior Editor
M. Baldea
University of Texas at Austin, Austin, Texas, United States
D. Bonvin
Federal Polytechnic School of Lausanne, Lausanne, Switzerland
G. Pannocchia
University of Pisa, Pisa, Italy
N. Petit
Engineering College Paris, Paris, France
Associate Editors
J. Bao
University of New South Wales, Sydney, New South Wales, Australia
L. Bergh
Federico Santa Maria Technical University, Valparaiso, Chile
B. Chachuat
Imperial College London, London, United Kingdom
W. Chen
Zhejiang University of Technology, Hangzhou, China
X. Chen
Zhejiang University, Hangzhou, China
I-Lung Chien
National Taiwan University, Taipei, Taiwan
P Daoutidis
University of Minnesota, Minneapolis, Minnesota, United States
H. Durand
Wayne State University, Detroit, Michigan, United States
P. Gopaluni
R. Gudi
Indian Institute of Technology Bombay, Mumbai, India
J. Hahn
Rensselaer Polytechnic Institute, Troy, New York, United States
B. Huang, PhD
University of Alberta Department of Chemical and Materials Engineering, Edmonton, Alberta, Canada
N. Hudon
Queen's University, Kingston, Ontario, Canada
A. Isaakson
ABB Sweden, Västerås, Sweden
S-S. Jang
National Tsing Hua University, Hsinchu, Taiwan
S. Jogwar
Indian Institute of Technology Bombay, Mumbai, India
A. Kumar
Praxair Inc Technology Center, Tonawanda, New York, United States
J. H. Lee
Korea Advanced Institute of Science and Technology, Daejeon, Korea, Republic of
F.V. Lima
West Virginia University, Morgantown, West Virginia, United States
J. Liu
University of Alberta, Edmonton, Alberta, Canada
S. Lucia
Technical University of Berlin, Berlin, Germany
W. Marquardt
RWTH Aachen University, Aachen, Germany
M. Mönnigmann
Ruhr University Bochum, Germany
M. Nadri
University Claude Bernard Lyon 1, Lyon Cedex, France
C. Ocampo-Martinez
Polytechnic University of Catalonia, Barcelona, Spain
L. Özkan
University of Technology Eindhoven, Eindhoven, Netherlands
S. Patwardhan
Indian Institute of Technology Bombay, Mumbai, India
J. Qin
University of Southern California, Los Angeles, California, United States
S. Skogestad
Norwegian University of Science and Technology, Trondheim, Norway
J. Wang
Auburn University, Auburn, Alabama, United States
L. Wang
RMIT University, Melbourne, Victoria, Australia
V. Zavala
University of Wisconsin Madison, Madison, Wisconsin, United States
C. H. Zhao, PhD
Zhejiang University Department of Control Science and Engineering, Hangzhou, China
D. Zhou
Tsinghua University, Beijing, China