High‐throughput production of high‐temperature capacitor films is realized by Qi Li, Jinliang He, Qing Wang, and co‐workers in article number 1805672 through fast and continuous deposition of a nanoscale thin layer of an insulating barrier using atmospheric‐pressure plasma‐enhanced chemical vapor deposition. This approach should be adaptable to the industrial extrusion method for highly productive manufacturing of capacitor films.

中文翻译：

---

聚合物电介质：聚合物电介质的可扩展，高通量和对环境无害的方法，在高温下表现出显着改善的电容性能（Adv。Mater。49/2018）

李琦，何金良，王青和同事在1805672号文章中通过使用大气压等离子快速连续沉积绝缘阻挡层的纳米级薄层，实现了高温电容器膜的高通量生产。增强化学气相沉积。该方法应适用于电容器膜的高生产率制造的工业挤出方法。