Humic acid removal by gas–liquid interface discharge plasma: performance, mechanism and comparison to ozonation,Environmental Science Water Research & Technology

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Humic acid removal by gas–liquid interface discharge plasma: performance, mechanism and comparison to ozonation
Environmental Science Water Research & Technology Pub Date : 2018-11-16 , DOI: 10.1039/c8ew00520f
Yanyan Cui _{1,

2,

3,

4,

5} , Jianwei Yu _{1,

2,

3,

4,

6} , Ming Su _{1,

2,

3,

4,

6} , Zeyu Jia _{1,

2,

3,

4,

6} , Tingting Liu _{1,

2,

3,

4,

6} , Gaku Oinuma _{7,

8,

9} , Tokiko Yamauchi _{7,

8,

9}

Affiliation

A novel advanced oxidation process (AOP) based on plasma in gas–liquid interface discharge was evaluated for humic acid removal. Much better performance was obtained compared to ozonation. The OH˙ radicals generated by reaction of in situ produced ozone and H₂O₂ during discharge process were mainly responsible for the removal.

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