In many applications, interfaces govern the performance of membranes. Structure, chemistry, electrostatics, and other properties of interfaces can dominate the selectivity, flux, fouling resistance, and other critical aspects of membrane functionality. Control over membrane interfacial properties, therefore, is a powerful means of tailoring performance. In this Minireview, we discuss the application of atomic layer deposition (ALD) and related techniques in the design of novel membrane interfaces. We discuss recent literature in which ALD is used to (1) modify the surface chemistry and interfacial properties of membranes, (2) tailor the pore sizes and separation characteristics of membranes, and (3) enable novel advanced functional membranes.

中文翻译：

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用于膜界面工程的原子层沉积

在许多应用中，界面决定着膜的性能。界面的结构，化学性质，静电性质和其他属性可以控制膜功能的选择性，通量，耐污性和其他关键方面。因此，对膜界面特性的控制是调整性能的有力手段。在此Minireview中，我们讨论了原子层沉积（ALD）和相关技术在新型膜界面设计中的应用。我们讨论了最近的文献，其中ALD用于（1）改变膜的表面化学和界面特性，（2）调整膜的孔径和分离特性，以及（3）启用新型高级功能膜。