The reaction of allyltriisopropylsilane with partially dehydroxylated sulfated zirconium oxide (SZO) forms surface organosilicon species. Solid‐state NMR studies of the organosilicon functionalized SZO shows that electrophilic [TIPS][SZO] sites are present on the surface, in addition to less reactive TIPS‐O_x and SiO_x species. The electrophilic [TIPS][SZO] sites are strong Lewis acids from solid‐state ³¹P NMR analysis of triethylphosphine oxide (O=PEt₃) contacted materials. [TIPS][SZO] is active in hydrodefluorination reactions in the presence of Et₃SiH.

中文翻译：

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硫酸化氧化锆上支持的亲电子有机硅位点活化C-F键

烯丙基三异丙基硅烷与部分脱羟基的硫酸氧化锆（SZO）反应形成表面有机硅物质。对有机硅官能化的SZO进行的固态NMR研究表明，表面上存在亲电[TIPS] [ SZO ]部位，除了反应性较差的TIPS-O _x和SiO _x种类之外。亲电子的[TIPS] [ SZO ]位是强三氧化二膦（O = PEt ₃）接触材料的固态³¹ P NMR分析得到的强路易斯酸。[TIPS] [ SZO ]在Et ₃ SiH存在下的加氢氟化反应中具有活性。