Highly porous thin films and nanostructure arrays are created by a simple process of selective dissolution of a water‐soluble material, Sr₃Al₂O₆. Heteroepitaxial nanocomposite films with self‐separated phases of a target material and Sr₃Al₂O₆ are first prepared by physical vapor deposition. NiO, ZnO, and Ni_1−xMg_xO are used as the target materials. Only the Sr₃Al₂O₆ phase in each nanocomposite film is selectively dissolved by dipping the film in water for 30 s at room temperature. This gentle and fast method minimizes damage to the remaining target materials and side reactions that can generate impurity phases. The morphologies and dimensions of the pores and nanostructures are controlled by the relative wettability of the separated phases on the growth substrates. The supercapacitor properties of the porous NiO films are enhanced compared to plain NiO films. The method can also be used to prepare porous films or nanostructure arrays of other oxides, metals, chalcogenides, and nitrides, as well as films or nanostructures with single‐crystalline, polycrystalline, or amorphous nature.

中文翻译：

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通过选择性溶解水溶性材料创建纳米多孔薄膜和纳米结构阵列

高多孔薄膜和纳米结构阵列是通过选择性溶解水溶性材料 Sr ₃ Al ₂ O ₆的简单过程创建的。首先通过物理气相沉积法制备了靶材和Sr ₃ Al ₂ O _{6自分离相的异质外延纳米复合薄膜。}使用NiO、ZnO和Ni _{1− x} Mg _x O作为靶材。通过在室温下将膜浸入水中30 s，只有每个纳米复合膜中的Sr ₃ Al ₂ O _{6相被选择性溶解。}这种温和而快速的方法最大限度地减少了对剩余靶材料的损害以及可能产生杂质相的副反应。孔和纳米结构的形态和尺寸由生长基底上分离相的相对润湿性控制。与普通 NiO 薄膜相比，多孔 NiO 薄膜的超级电容器性能得到了增强。该方法还可用于制备其他氧化物、金属、硫族化物和氮化物的多孔薄膜或纳米结构阵列，以及具有单晶、多晶或非晶性质的薄膜或纳米结构。