Abstract Photostructurable Li2O-Al2O3-SiO2 glass is a promising material to fabricate complex three-dimensional structure with a high aspect ratio. However, its high dielectric loss at high frequencies has restrained its application in the field of integrated circuits packaging. In this research, La2O3, which has a large ionic radius, as well as strong polarization and bonding strength, was used to obstruct mobile ion migration to reduce the dielectric loss. The results indicated that moderate doping with La2O3 could effectively reduce the dielectric loss. When the dopant amount was 3%, the dielectric loss was successfully reduced to a minimum of 4 × 10−3 with a dielectric constant of 6.6 at 1 GHz, and this sample also possessed the optimal dielectric-temperature stability. Additionally, the effects of doping on the photosensitivity and crystallization behavior were also analysed. The results suggested that La2O3 doping did not affect the photosensitivity and selective crystallization characteristics. However, La2O3 restrained the precipitation of silicate from the [SiO4] tetrahedron, resulting in a decrease of nucleation rate and a delay of crystallization.

中文翻译：

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La2O3掺杂对Li2O-Al2O3-SiO2光致结构玻璃光敏性、结晶行为和介电性能的影响

摘要 可光致结构的Li2O-Al2O3-SiO2玻璃是一种很有前景的材料，可以制备具有高纵横比的复杂三维结构。然而，其在高频下的高介电损耗限制了其在集成电路封装领域的应用。在这项研究中，具有大离子半径、强极化和结合强度的 La2O3 被用来阻止移动离子迁移以减少介电损耗。结果表明，适度掺杂La2O3可有效降低介电损耗。当掺杂量为 3% 时，介电损耗成功降低到最小值 4 × 10-3，1 GHz 下的介电常数为 6.6，并且该样品还具有最佳的介电温度稳定性。此外，还分析了掺杂对光敏性和结晶行为的影响。结果表明，La2O3 掺杂不影响光敏性和选择性结晶特性。然而，La2O3抑制了[SiO4]四面体中硅酸盐的析出，导致成核速率降低和结晶延迟。