Abstract Reduction of graphene oxide (GO) to a low-resistance product is one of the most versatile routes to obtain large volume graphene-based materials. A number of chemical and thermal methods are being applied to achieve this goal, albeit each one is bound to certain disadvantages and limitations. Laser-assisted reduction has emerged as a promising method apt to overcome issues related to chemical and thermal reduction. Despite that a large number of efforts have been focused on laser-induced reduction of GO, its transformation to high quality reduced GO still remains a bottleneck. Here, it is shown that low-cost, millisecond lasers, widely used in the welding industry, achieve excellent reduction of GO to a product with the lowest sheet resistance yet reported by any laser-assisted method. For comparison, GO is reduced by chemical and thermal methods. Raman and x-ray photoelectron spectroscopies are applied to investigate the underlying structural changes providing evidence for the removal of oxygen-containing species and defect healing. Operation at ambient conditions, single pulse irradiation and a 2.60 mm wide focusing spot, demonstrate the high potential of this approach to the scalability of the reduction process towards producing large volumes of high-quality reduced graphene oxide at low cost.

中文翻译：

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环境条件下激光辅助还原氧化石墨烯的有效缺陷修复和超低薄层电阻

摘要 将氧化石墨烯 (GO) 还原为低电阻产品是获得大体积石墨烯基材料的最通用途径之一。许多化学和热方法被应用于实现这一目标，尽管每种方法都必然存在某些缺点和限制。激光辅助还原已成为一种有前途的方法，可以克服与化学和热还原相关的问题。尽管大量的努力已经集中在激光诱导的 GO 还原上，但其向高质量还原 GO 的转变仍然是一个瓶颈。在这里，表明广泛用于焊接行业的低成本、毫秒激光器可将 GO 出色地降低到具有最低薄层电阻的产品，这是迄今为止任何激光辅助方法所报道的。为了比较，GO 可通过化学和热方法还原。应用拉曼和 X 射线光电子光谱来研究潜在的结构变化，为去除含氧物质和缺陷愈合提供证据。在环境条件下运行、单脉冲照射和 2.60 毫米宽的聚焦点，证明了这种方法在还原过程的可扩展性方面具有巨大潜力，可以以低成本生产大量高质量的还原氧化石墨烯。