First complex oxide superconductor by atomic layer deposition†,Chemical Communications

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First complex oxide superconductor by atomic layer deposition†
Chemical Communications ( IF 4.9 ) Pub Date : 2018-07-03 00:00:00 , DOI: 10.1039/c8cc04998j
Henrik Hovde Sønsteby _{1,

2,

3,

4} , Thomas Aarholt _{2,

4,

5,

6} , Øystein Prytz _{2,

4,

5,

6} , Helmer Fjellvåg _{1,

2,

3,

4} , Ola Nilsen _{1,

2,

3,

4}

Affiliation

We here report on atomic layer deposition (ALD) of the superconducting complex oxide La_2−xSr_xCuO_4−y and provide details of the structural and electrical properties of such films. This is the first report on a complex oxide thin film with superconducting properties that has been deposited by atomic layer deposition.

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