A novel Ag₃PO₄/reduced graphene oxide/Bi₂MoO₆ (Ag₃PO₄/RGO/Bi₂MoO₆) Z-scheme photocatalyst has been successfully prepared by a precipitation-solvothermal method. The composition, morphology, structure and optical properties of the ternary composite were thoroughly investigated. The obtained Ag₃PO₄/RGO/Bi₂MoO₆ composite displayed significantly enhanced photocatalytic activity for the degradation of methylene blue (MB) under visible light irradiation, and its degradation rate (0.14575 min⁻¹) was approximately 2.34, 2.63 and 4.97 times faster than that of the Ag₃PO₄/Bi₂MoO₆ composite, pure Ag₃PO₄ and Bi₂MoO₆, respectively. Meanwhile, the Ag₃PO₄/RGO/Bi₂MoO₆ composite exhibited better stability compared with pure Ag₃PO₄ after four consecutive reuses. In addition, it shows good photodegradation efficiency for five other dyes under visible light irradiation. The improved photocatalytic performance and stability could be ascribed to the larger surface area, extended visible-light absorption capability and high-efficiency separation of electron–hole pairs of the Ag₃PO₄/RGO/Bi₂MoO₆ composite. Furthermore, RGO could act as a charge transmission bridge to accelerate the electron transfer from Ag₃PO₄ to Bi₂MoO₆ (Ag₃PO₄ → RGO → Bi₂MoO₆) in this Z-scheme system; thus the photocorrosion of Ag₃PO₄ and the recombination of charge carriers were effectively suppressed. The energy band structure and free radical capturing experiments proved that the electrons in the conduction band (CB) of Bi₂MoO₆ had stronger reducibility and the holes in the valence band (VB) of Ag₃PO₄ had higher oxidizability. Simultaneously, combined with the results of PL spectroscopy and photoelectrochemical measurements, the mechanism of Z-scheme charge transfer in the Ag₃PO₄/RGO/Bi₂MoO₆ composite was further confirmed. This study provides an idea for improving the anti-photocorrosion and photocatalytic performance of photosensitive semiconductors.

中文翻译：

---

高效稳定的Z型Ag ₃ PO ₄ /还原氧化石墨烯/ Bi ₂ MoO ₆可见光光催化剂的 构建及机理

通过沉淀-溶剂热法成功地制备了新型的Ag ₃ PO ₄ /还原氧化石墨烯/ Bi ₂ MoO ₆（Ag ₃ PO ₄ / RGO / Bi ₂ MoO ₆）Z-方案光催化剂。对三元复合材料的组成，形貌，结构和光学性质进行了深入研究。所得的Ag ₃ PO ₄ / RGO / Bi ₂ MoO ₆复合材料在可见光照射下对亚甲基蓝（MB）的降解具有显着增强的光催化活性，其降解速率为0.14575 min ^-1）分别比纯Ag ₃ PO ₄和Bi ₂ MoO ₆的Ag ₃ PO ₄ / Bi ₂ MoO ₆复合材料快约2.34、2.63和4.97倍。同时，与纯Ag ₃ PO ₄相比，Ag ₃ PO ₄ / RGO / Bi ₂ MoO ₆复合材料表现出更好的稳定性。连续四次重复使用后。此外，它在可见光照射下对其他五种染料显示出良好的光降解效率。Ag ₃ PO ₄ / RGO / Bi ₂ MoO ₆复合材料的更大的表面积，更大的可见光吸收能力和电子-空穴对的高效分离，可以提高光催化性能和稳定性。此外，RGO可以充当电荷传输桥，以加速电子从Ag ₃ PO ₄到Bi ₂ MoO _6的转移（Ag ₃ PO ₄ →RGO→Bi ₂ MoO ₆）在此Z方案系统中；因此，有效地抑制了Ag ₃ PO ₄的光腐蚀和载流子的复合。能带结构和自由基捕获实验证明，Bi ₂ MoO ₆的导带（CB）中的电子具有较强的还原性，而Ag ₃ PO ₄的价带（VB）中的空穴具有较高的氧化性。同时，结合PL光谱和光电化学测量结果，Z方案在Ag ₃ PO ₄ / RGO / Bi ₂ MoO _6中的电荷转移机理复合材料进一步得到确认。这项研究为改善光敏半导体的抗光蚀性能和光催化性能提供了一个思路。