Plasmonics of metal and alloy nanoparticles finds immense applications in materials science, medicine and advanced physics. Controlled deposition of these nanoparticles onto simple substrates to yield high Plasmon intensity for different applications such as single molecule sensing is still a challenge. Herein, we present a very simple and general strategy for their controlled deposition, plausibly mediated by the anti-solvent effect or preferential solvation.

中文翻译：

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用于控制金属和合金纳米粒子沉积的简单反溶剂方法

金属和合金纳米粒子的等离子技术在材料科学，医学和高级物理领域得到了广泛的应用。将这些纳米颗粒有控制地沉积在简单的基底上以产生高等离子强度以用于不同应用（例如单分子传感）仍然是一个挑战。在本文中，我们提出了一种非常简单和通用的策略来控制其沉积，可能是由反溶剂作用或优先溶剂化介导的。