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Elimination of transforming activity and gene degradation during UV and UV/H2O2 treatment of plasmid-encoded antibiotic resistance genes
Environmental Science Water Research & Technology Pub Date : 2018-05-30 , DOI: 10.1039/c8ew00200b Younggun Yoon 1, 2, 3, 4 , Michael C. Dodd 5, 6, 7, 8 , Yunho Lee 1, 2, 3, 4
中文翻译:
质粒编码的抗生素抗性基因在 UV 和 UV/H2O2 处理过程中消除转化活性和基因降解
更新日期:2018-05-30
Environmental Science Water Research & Technology Pub Date : 2018-05-30 , DOI: 10.1039/c8ew00200b Younggun Yoon 1, 2, 3, 4 , Michael C. Dodd 5, 6, 7, 8 , Yunho Lee 1, 2, 3, 4
Affiliation
This study determined deactivation of transforming activity of an ARG and the ARG degradation during UV and UV/H2O2 treatment of plasmid pUC19 containing an ampicillin resistance gene.
中文翻译:
质粒编码的抗生素抗性基因在 UV 和 UV/H2O2 处理过程中消除转化活性和基因降解
本研究确定了在UV和UV/H 2 O 2处理含有氨苄青霉素抗性基因的质粒pUC19期间ARG转化活性的失活和ARG降解。