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Comparative corrosion resistance properties between (Cu, Ce)-DLC and Ti co-doped (Cu, Ce)/Ti-DLC films prepared via magnetron sputtering method
Chemical Physics Letters ( IF 2.8 ) Pub Date : 2018-05-25 , DOI: 10.1016/j.cplett.2018.05.061
Yangmin Wu , Shengguo Zhou , Wenjie Zhao , Lu Ouyang

Element co-doping is an effective fashion to improve the properties of carbon-based film and amplify its application area. Here, (Cu, Ce)-DLC and (Cu, Ce)/Ti-DLC films were successfully prepared via magnetron sputtering. Evolutions of surface/interface morphology, microstructure and wettability of as-prepared films were investigated systematically to in-depth analysis the relationship between their microstructure and anti-corrosion capability. (Cu, Ce)/Ti-DLC film possessed a thicker thickness compared to (Cu, Ce)-DLC film. Raman spectra of as-prepared films exposed quintessential features of carbon peak. Scanning vibrating electrode technique revealed the local electrochemical corrosion process of films. Particularly, (Cu, Ce)/Ti-DLC film could demonstrate superior anti-corrosion ability.



中文翻译:

磁控溅射法制备的(Cu,Ce)-DLC和Ti共掺杂(Cu,Ce)/ Ti-DLC膜之间的比较耐腐蚀性

元素共掺杂是改善碳基薄膜性能并扩大其应用领域的有效方式。在此,通过磁控溅射成功地制备了(Cu,Ce)-DLC和(Cu,Ce)/ Ti-DLC膜。系统地研究了所制备薄膜的表面/界面形态,微观结构和润湿性的演变,以深入分析其微观结构与抗腐蚀能力之间的关系。与(Cu,Ce)-DLC膜相比,(Cu,Ce)/ Ti-DLC膜具有较厚的厚度。制备好的薄膜的拉曼光谱显示出碳峰的典型特征。扫描振动电极技术揭示了薄膜的局部电化学腐蚀过程。特别地,(Cu,Ce)/ Ti-DLC膜可以表现出优异的抗腐蚀能力。

更新日期:2018-05-25
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