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Room Temperature van der Waals Epitaxy of Metal Thin Films on Molybdenum Disulfide
Crystal Growth & Design ( IF 3.8 ) Pub Date : 2018-04-30 00:00:00 , DOI: 10.1021/acs.cgd.8b00257
Anna C. Domask 1 , Kayla A. Cooley 1 , Bernd Kabius , Michael Abraham 1 , Suzanne E. Mohney 1
Affiliation  

Transmission electron microscopy, in particular selected area electron diffraction, was used to investigate the orientational relationship of Al, Ag, Cu, Mn, Mo, Ni, Pd, Ru, Re, and Zn deposited via physical vapor deposition on MoS2 at room temperature. Past work has shown that a few face-centered cubic (FCC) metals (Ag, Au, Pb, Pd, and Pt) could be deposited epitaxially on MoS2. However, we found that additional FCC metals (Al and Cu) could be deposited epitaxially at room temperature on MoS2 with the orientational relationship M(111)∥MoS2(0001) and M[22̅0]∥MoS2[112̅0], while a hexagonally close-packed (HCP) metal Zn was epitaxial on MoS2 with a M(0001)∥MoS2(0001) and M[112̅0]∥MoS2[112̅0] relationship. However, the FCC metal Ni, body-centered cubic metal Mo, and HCP metals Re and Ru were not epitaxial on deposition or even after annealing at 673 K for 4 h. By comparing the results with both physical constants and modeling of the metal/MoS2 systems, we observed that metals with a close-packed plane with six-fold symmetry, a high homologous temperature, and a low barrier to surface diffusion on MoS2 are more likely to grow epitaxially at room temperature on MoS2.

中文翻译:

二硫化钼在金属薄膜上的室温范德华外延

使用透射电子显微镜,特别是选定的区域电子衍射,研究了室温下通过物理气相沉积在MoS 2上沉积的Al,Ag,Cu,Mn,Mo,Ni,Pd,Ru,Re和Zn的取向关系。过去的工作表明,一些面心立方(FCC)金属(Ag,Au,Pb,Pd和Pt)可以外延沉积在MoS 2上。然而,我们发现,附加的FCC金属(Al和Cu)可能外延在室温下沉积在的MoS 2与取向关系M(111)∥MoS 2(0001)和M [220]∥MoS 2 [1120],而一个六方密堆(HCP)金属锌是外延上的MoS 2与M(0001)∥MoS 2(0001)和M [1120]∥MoS 2 [1120]的关系。但是,FCC金属Ni,体心立方金属Mo和HCP金属Re和Ru在沉积时甚至在673 K退火4小时后都没有外延。通过将结果与两个物理常数比较和所述金属的建模/ MOS 2个系统中,我们观察到的最密的平面金属与六重对称性,高的同源性的温度,和一个低势垒到表面扩散上的MoS 2是更可能在室温下在MoS 2上外延生长。
更新日期:2018-04-30
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