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Deep surface Cu depletion induced by K in high‐efficiency Cu(In,Ga)Se2 solar cell absorbers
Progress in Photovoltaics ( IF 6.7 ) Pub Date : 2018-03-25 , DOI: 10.1002/pip.3010
Olivier Donzel-Gargand 1 , Thomas Thersleff 2 , Jan Keller 1 , Tobias Törndahl 1 , Fredrik Larsson 1 , Erik Wallin 3 , Lars Stolt 1, 3 , Marika Edoff 1
Affiliation  

In this work, we used K‐rich glass substrates to provide potassium during the coevaporation of Cu(In,Ga)Se2 (CIGS) absorber layers. Subsequently, we applied a postdeposition treatment (PDT) using KF or RbF to some of the grown absorbers. It was found that the presence of K during the growth of the CIGS layer led to cell efficiencies beyond 17%, and the addition of a PDT pushed it beyond 18%. The major finding of this work is the observation of discontinuous 100‐ to 200‐nm‐deep Cu‐depleted patches in the vicinity of the CdS buffer layer, correlated with the presence of K during the growth of the absorber layer. The PDT had no influence on the formation of these patches. A second finding concerns the composition of the Cu‐depleted areas, where an anticorrelation between Cu and both In and K was measured using scanning transmission electron microscopy. Furthermore, a steeper Ga/(In+Ga) ratio gradient was measured for the absorbers grown with the presence of K, suggesting that K hinders the group III element interdiffusion. Finally, no Cd in‐diffusion to the CIGS layer could be detected. This indicates that if CdCu substitution occurs, either their concentration is below our instrumental detection limit or its presence is contained within the first 6 nm from the CdS/CIGS interface.

中文翻译:

高效Cu(In,Ga)Se2太阳能电池吸收器中K诱导的深表面Cu耗竭

在这项工作中,我们使用富含K的玻璃基底在Cu(In,Ga)Se 2的共蒸发过程中提供钾。(CIGS)吸收层。随后,我们对一些生长的吸收剂进行了使用KF或RbF的沉积后处理(PDT)。发现在CIGS层生长期间钾的存在导致电池效率超过17%,而PDT的添加使钾效率超过18%。这项工作的主要发现是在CdS缓冲层附近观察到不连续的100至200 nm深的贫铜斑块,这与吸收层生长过程中K的存在有关。PDT对这些补丁的形成没有影响。第二个发现涉及贫铜区域的组成,其中使用扫描透射电子显微镜测量了铜与In和K的反相关性。此外,对于在存在K的情况下生长的吸收剂,测得的Ga /(In + Ga)比梯度更陡,表明K阻碍了III类元素的相互扩散。最终,没有检测到Cd扩散到CIGS层中。这表明如果镉发生取代,或者它们的浓度低于我们的仪器检测极限,或者它的存在存在于CdS / CIGS界面的前6 nm之内。
更新日期:2018-03-25
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