We present measurements on the vibrational relaxation of NO(v = 2) scattered from atomically defined thin films of Ag on Au(111). The vibrational relaxation probability is strongly dependent on film thickness, increasing with each of the first three Ag monolayers. We interpret this as the influence of work function which changes with layer thickness. This supports the postulated mechanism of NO vibrational relaxation involving a transient NO^– anion.

中文翻译：

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振动弛豫几率的功函数依赖性：Ag / Au（111）超薄金属膜中的NO（v = 2）散射

我们目前对从原子上定义在Au（111）上的Ag薄膜散射的NO（v = 2）的振动弛豫进行了测量。振动弛豫概率在很大程度上取决于膜厚度，并且随着前三个Ag单层的增加而增加。我们将其解释为功函数的影响，它随层厚度的变化而变化。这不支持任何涉及瞬态NO振动弛豫的假定的机制^-阴离子。