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A Comprehensive Scope of Peripheral and Axial Substituent Effect on the Spectroelectrochemistry of Boron Subphthalocyanines
The Journal of Physical Chemistry A ( IF 2.9 ) Pub Date : 2018-04-19 00:00:00 , DOI: 10.1021/acs.jpca.8b02023
Kathleen L. Sampson 1 , Xiaoqin Jiang 2 , Esmeralda Bukuroshi 1 , Aleksa Dovijarski 1 , Hasan Raboui 1 , Timothy P. Bender 1, 3, 4 , Karl M. Kadish 2
Affiliation  

An extensive study of the electrochemical and spectroelectrochemical properties of 14 boron subphthalocyanine (BsubPc) derivatives with various axial and peripheral substituents was performed in 1,2-dichloromethane (CH2Cl2) containing 0.1 M tetra-n-butyl-ammonium perchlorate (TBAP) as the supporting electrolyte. From the cyclic voltammetry results, all compounds exhibit one oxidation and at least two reduction processes within the solvent potential window of +1.6 to −1.8 V vs SCE. It was found that the reversibility of the redox reactions depends on the axial and peripheral substituents and the dipole moment of the boron-to-axial substituent. In general, UV–vis absorption spectra of the singly reduced BsubPc derivatives exhibit three equal intensity peaks in the 450 to 650 nm region that are derived from the maximum BsubPc absorbance peak upon reduction. Axial substituents affect the intensity of the three peaks upon reduction, while peripheral substituents shift the position of the peaks to higher wavelengths. Upon oxidation, the UV–vis absorption profile flattens considerably with only a single broad (∼300 nm) band apparent. Understanding the effect of substituents on the stability of the redox processes of BsubPcs will aid in further development of these materials for applications in organic electronic devices.

中文翻译:

周边和轴向取代基对硼次酞菁硼光谱电化学影响的综合范围

在含有0.1 M四-n的1,2-二氯甲烷(CH 2 Cl 2)中,对14种具有各种轴向和周边取代基的亚酞菁硼(BsubPc)衍生物的电化学和光谱电化学性质进行了广泛的研究。-高氯酸正丁铵盐(TBAP)作为支持电解质。从循环伏安法的结果来看,所有化合物在+1.6至-1.8 V(相对于SCE)的溶剂电势窗口内均表现出一种氧化和至少两种还原过程。发现氧化还原反应的可逆性取决于轴向和周边取代基以及硼-轴向取代基的偶极矩。通常,单个还原的BsubPc衍生物的UV-vis吸收光谱在450至650 nm区域显示三个相等的强度峰,这些峰来自还原时的最大BsubPc吸收峰。轴向取代基在还原时影响三个峰的强度,而外围取代基将峰的位置移至更高的波长。氧化后 可见光吸收曲线明显变平,只有一个明显的宽波段(约300 nm)。了解取代基对BsubPcs氧化还原过程稳定性的影响将有助于进一步开发这些材料以用于有机电子设备。
更新日期:2018-04-19
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