The formation of TiC and Ti phases and their influence on their mechanical properties was studied in this work. Thin layers were deposited by DC magnetron sputtering at room temperature in ultrahigh vacuum from Ti and C targets.

Cubic TiC phase (c-TiC) was formed from 58 to 86 at.% Ti content. First formation of hexagonal Ti (h-Ti) occurred from 86 at.% Ti content. The c-TiC disappears from 90 at.% Ti content. Films with 86 at.% Ti content the c-TiC structure can transform to h-Ti by sequential stacking faults. Dominance of c-TiC(111) texture with increasing Ti content was observed.

The hardness of thin films agree with structural observations. The highest hardness value (∼26 GPa) showed the c-TiC thin film with 67 at% Ti content. The nanohardness values showed decreasing character with increasing Ti content over 70 at.%. The lowest values of nanohardness (∼10 GPa) was observed for thin films with only h-Ti phase.

在这项工作中研究了TiC和Ti相的形成及其对它们的机械性能的影响。在室温和超高真空下，通过直流磁控溅射从Ti和C靶沉积薄层。

立方TiC相（c-TiC）的Ti含量为58至86 at。％。六角形Ti（h-Ti）的首次形成是从86 at。％的Ti含量开始的。c-TiC从90 at。％的Ti含量中消失。Ti含量为86 at。％的薄膜的c-TiC结构可以通过顺序堆垛层错转变为h-Ti。观察到c-TiC（111）织构随Ti含量增加而占主导地位。

薄膜的硬度与结构观察结果一致。最高硬度值（约26 GPa）显示c-TiC薄膜具有67 at％的Ti含量。纳米硬度值显示出随着Ti含量增加超过70at。％而降低的特性。对于仅具有h-Ti相的薄膜，观察到最低的纳米硬度值（约10 GPa）。