Tantalum films were deposited on negatively biased Ti6Al4V substrates using filtered cathodic vacuum arc deposition to enhance the corrosion resistance of the Ti6Al4V alloy. The effect of substrate voltage bias on the microstructure, mechanical and corrosion properties was examined and the cytocompatibility of the deposited films was verified with mammalian cell culturing. The Ta films deposited with substrate bias of −100 V and −200 V show a mixture of predominantly β phase and minority of α phase. The Ta/−100 V film shows adhesive failure at the Ti/Ta interface and a cohesive fracture is observed in Ta/−200 V film. The Ta/−100 V showed a significant improvement in corrosion resistance, which is attributed to the stable oxide layer. The in-vitro cytocompatibility of the materials was investigated using rat bone mesenchymal stem cells, and the results show that the Ta films have no adverse effect on mammalian cell adhesion and spreading proliferation.

使用过滤阴极真空电弧沉积法将钽膜沉积在负偏压的Ti6Al4V基板上，以增强Ti6Al4V合金的耐腐蚀性。检查了衬底偏压对微结构，机械性能和腐蚀性能的影响，并通过哺乳动物细胞培养验证了沉积膜的细胞相容性。以-100 V和-200 V的衬底偏压沉积的Ta膜显示出主要是β相和少数α相的混合物。Ta / -100 V膜在Ti / Ta界面处显示出粘合失败，并且在Ta / -200 V膜中观察到内聚破裂。Ta / -100V显示出显着改善的耐腐蚀性，这归因于稳定的氧化物层。在中-体外 使用大鼠骨间充质干细胞对材料的细胞相容性进行了研究，结果表明Ta膜对哺乳动物细胞的粘附和扩散增殖没有不利影响。