This study reports a simple and effective technique for the high‐throughput fabrication of flexible all‐carbon nanotube (CNT) electronics using a photosensitive dry film instead of traditional liquid photoresists. A 10 in. sized photosensitive dry film is laminated onto a flexible substrate by a roll‐to‐roll technology, and a 5 µm pattern resolution of the resulting CNT films is achieved for the construction of flexible and transparent all‐CNT thin‐film transistors (TFTs) and integrated circuits. The fabricated TFTs exhibit a desirable electrical performance including an on–off current ratio of more than 10⁵, a carrier mobility of 33 cm² V⁻¹ s⁻¹, and a small hysteresis. The standard deviations of on‐current and mobility are, respectively, 5% and 2% of the average value, demonstrating the excellent reproducibility and uniformity of the devices, which allows constructing a large noise margin inverter circuit with a voltage gain of 30. This study indicates that a photosensitive dry film is very promising for the low‐cost, fast, reliable, and scalable fabrication of flexible and transparent CNT‐based integrated circuits, and opens up opportunities for future high‐throughput CNT‐based printed electronics.

中文翻译：

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柔性和透明全碳纳米管电子器件的高通量制备

这项研究报告了一种简单有效的技术，该技术使用光敏干膜代替传统的液态光致抗蚀剂来高通量地制造柔性全碳纳米管（CNT）电子产品。通过卷对卷技术将10英寸大小的光敏干膜层压到柔性基板上，所得到的CNT膜的图案分辨率达到5 µm，用于构造柔性和透明的全CNT薄膜晶体管（TFT）和集成电路。制成的TFT具有令人满意的电性能，包括大于10 ⁵的开关电流比，33 cm ² V ^-1 s ^-1的载流子迁移率，并且有很小的磁滞。导通电流和迁移率的标准偏差分别为平均值的5％和2％，这表明器件具有出色的重现性和均匀性，从而可以构建电压增益为30的大噪声裕度逆变器电路。研究表明，光敏干膜对于低成本，快速，可靠和可扩展的柔性和透明CNT基集成电路的制造非常有前途，并为未来的高通量CNT基印刷电子学打开了机遇。