Near-field holography (NFH) combined with electron beam lithography (EBL)-written phase masks is a promising method for the rapid realization of diffraction gratings with high resolution and high accuracy in line density distribution. We demonstrate a dynamic exposure method in which the grating substrate is shifted during pattern transfer. This reduces the effects of stitching errors, resulting in the decreased intensity of the optical stray light (i.e., Rowland ghosts). We demonstrate the intensity suppression of ghosts by 60%. This illustrates the potential for dynamic NFH to suppress undesirable periodic patterns from phase masks and alleviate the stitching errors induced by EBL.

中文翻译：

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通过动态曝光近场全息术减少衍射光栅中的罗兰重影

近场全息（NFH）结合电子束光刻（EBL）编写的相位掩膜是一种有希望的方法，可快速实现具有高分辨率和线密度分布高精度的衍射光栅。我们演示了一种动态曝光方法，其中在图案转移过程中光栅基板发生了位移。这减少了缝合误差的影响，从而导致光学杂散光（即罗兰重影）的强度降低。我们证明了鬼影强度抑制了60％。这说明了动态NFH抑制来自相位掩模的不良周期性图案并减轻EBL引起的拼接误差的可能性。