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Increasing the Efficiency of Organic Dye‐Sensitized Solar Cells over 10.3% Using Locally Ordered Inverse Opal Nanostructures in the Photoelectrode
Advanced Functional Materials ( IF 19.0 ) Pub Date : 2018-02-05 , DOI: 10.1002/adfm.201706291
Lin Xu 1 , Cyril Aumaitre 1 , Yann Kervella 1 , Gérard Lapertot 1 , Cristina Rodríguez-Seco 2 , Emilio Palomares 2, 3 , Renaud Demadrille 1 , Peter Reiss 1
Affiliation  

3D inverse opal (3D‐IO) oxides are very appealing nanostructures to be integrated into the photoelectrodes of dye‐sensitized solar cells (DSSCs). Due to their periodic interconnected pore network with a high pore volume fraction, they facilitate electrolyte infiltration and enhance light scattering. Nonetheless, preparing 3D‐IO structures directly on nonflat DSSC electrodes is challenging. Herein, 3D‐IO TiO2 structures are prepared by templating with self‐assembled polymethyl methacrylate spheres on glass substrates, impregnation with a mixed TiO2:SiO2 precursor and calcination. The specific surface increases from 20.9 to 30.7 m2 g−1 after SiO2 removal via etching, which leads to the formation of mesopores. The obtained nanostructures are scraped from the substrate, processed as a paste, and deposited on photoelectrodes containing a mesoporous TiO2 layer. This procedure maintains locally the 3D‐IO order. When sensitized with the novel benzothiadiazole dye YKP‐88, DSSCs containing the modified photoelectrodes exhibit an efficiency of 10.35% versus 9.26% for the same devices with conventional photoelectrodes. Similarly, using the ruthenium dye N719 as sensitizer an efficiency increase from 5.31% to 6.23% is obtained. These improvements originate mainly from an increase in the photocurrent density, which is attributed to an enhanced dye loading obtained with the mesoporous 3D‐IO structures due to SiO2 removal.

中文翻译:

使用光电极中的局部有序反蛋白石纳米结构,可将有机染料敏化太阳能电池的效率提高超过10.3%

3D反蛋白石(3D-IO)氧化物是非常吸引人的纳米结构,可以集成到染料敏化太阳能电池(DSSC)的光电电极中。由于它们具有高孔体积分数的周期性互连孔网络,它们有助于电解质渗透并增强光散射。尽管如此,直接在不平坦的DSSC电极上制备3D-IO结构仍然具有挑战性。在此,通过在玻璃基板上用自组装的聚甲基丙烯酸甲酯球进行模板化,用TiO 2:SiO 2混合前体浸渍并煅烧来制备3D-IO TiO 2结构。SiO 2之后,比表面积从20.9增加到30.7 m 2 g -1通过蚀刻去除,这导致中孔的形成。从基板刮下获得的纳米结构,将其加工成糊剂,并沉积在包含介孔TiO 2层的光电极上。此过程在本地维护3D-IO顺序。当用新型苯并噻二唑染料YKP-88进行敏化时,含有修饰光电极的DSSC的效率为10.35%,而使用常规光电极的相同装置的效率为9.26%。类似地,使用钌染料N719作为敏化剂,可以将效率从5.31%提高到6.23%。这些改善主要源于光电流密度的增加,这归因于由于去除了SiO 2而使中孔3D-IO结构获得的染料负载增加。
更新日期:2018-02-05
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