当前位置:
X-MOL 学术
›
Nat. Mater.
›
论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Corrigendum: Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors
Nature Materials ( IF 41.2 ) Pub Date : 2018-01-23 , DOI: 10.1038/nmat5067 Xin Lin , Berthold Wegner , Kyung Min Lee , Michael A. Fusella , Fengyu Zhang , Karttikay Moudgil , Barry P. Rand , Stephen Barlow , Seth R. Marder , Norbert Koch , Antoine Kahn
Nature Materials ( IF 41.2 ) Pub Date : 2018-01-23 , DOI: 10.1038/nmat5067 Xin Lin , Berthold Wegner , Kyung Min Lee , Michael A. Fusella , Fengyu Zhang , Karttikay Moudgil , Barry P. Rand , Stephen Barlow , Seth R. Marder , Norbert Koch , Antoine Kahn
Corrigendum: Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors
中文翻译:
更正:通过光激活有机半导体中的n掺杂来突破热力学极限
更正:通过光激活有机半导体中的n掺杂来突破热力学极限
更新日期:2018-01-23
Corrigendum: Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors, Published online: 23 January 2018; doi:10.1038/nmat5067
Corrigendum: Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors中文翻译:
更正:通过光激活有机半导体中的n掺杂来突破热力学极限
更正:通过光激活有机半导体中的n掺杂来突破热力学极限
更正:通过光激活有机半导体中的n掺杂突破热力学极限,在线发布:2018年1月23日; doi:10.1038 / nmat5067
更正:通过光激活有机半导体中的n掺杂来突破热力学极限