Abstract Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.

中文翻译：

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一种定制溅射 WS 2 薄膜微观结构和耐磨性的简单策略

摘要 溅射的WS2薄膜可以通过添加一定量的异质元素来克服多孔柱状微观结构，从而提高耐磨性。然而，WS2-异质元素复合膜在低地球轨道环境中摩擦学性能的衰退将是一个潜在的危险，因为大多数异质元素会被原子氧氧化。在此，通过改变沉积氩气压力来调节等离子体轰击生长的 WS2 膜，特征性的多孔微结构消失了。在优化条件下，溅射的 WS2 薄膜表现出致密的微观结构，高 S 与 W 的比例，从而具有更好的耐磨性。然而，过度轰击会导致 WS2 薄膜中 S 原子的显着损失和摩擦学性能的恶化。