We show that dehydrogenation of hydrogenated graphene proceeds much more slowly for bilayer systems than for single layer systems. We observe that an underlayer of either pristine or hydrogenated graphene will protect an overlayer of hydrogenated graphene against a number of chemical oxidants, thermal dehydrogenation, and degradation in an ambient environment over extended periods of time. Chemical protection depends on the ease of oxidant intercalation, with good intercalants such as Br₂ demonstrating much higher reactivity than poor intercalants such as 1,2-dichloro-4,5-dicyanonbenzoquinone (DDQ). Additionally, the rate of dehydrogenation of hydrogenated graphene at 300 °C in H₂/Ar was reduced by a factor of roughly 10 in the presence of a protective underlayer of graphene or hydrogenated graphene. Finally, the slow dehydrogenation of hydrogenated graphene in air at room temperature, which is normally apparent after a week, could be completely eliminated in samples with protective underlayers over the course of 39 days. Such protection will be critical for ensuring the long-term stability of devices made from functionalized graphene.

中文翻译：

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从下面进行保护：使用石墨烯底层稳定氢化石墨烯

我们表明，与单层系统相比，双层系统氢化石墨烯的脱氢过程要慢得多。我们观察到，原始的或氢化的石墨烯的底层将保护氢化的石墨烯的顶层免受多种化学氧化剂，热脱氢以及在延长的时间段内在周围环境中的降解。化学保护取决于氧化剂嵌入的难易程度，良好的嵌入剂（例如Br _2）显示出比不良嵌入剂（例如1,2-二氯-4,5-二氰基苯醌（DDQ））高得多的反应性。另外，氢化石墨烯在H _2中在300°C下的脱氢速率在石墨烯或氢化石墨烯的保护性底层的存在下，/ Ar降低了约10倍。最后，室温下空气中氢化石墨烯的缓慢脱氢通常在一周后就可以解决，这种情况在39天的过程中可以完全消除带有保护性底层的样品。这种保护对于确保由功能化石墨烯制成的设备的长期稳定性至关重要。