The products from the 193 nm irradiation of triphenylsulfonium nonaflate (TPS) embedded in a poly(methyl methacrylate) (PMMA) film have been characterized. The analysis of the photoproduct formation was performed using chromatographic techniques including HPLC, GPC and GC-MS as well as UV-vis and NMR spectroscopic methods. Two previously unreported TPS photoproducts, triphenylene and dibenzothiophene, were detected; additionally, GPC and DOSY-NMR spectroscopic analyses after irradiation suggested that TPS fragments had been incorporated into the polymer film. The irradiation of acetonitrile solutions containing 10% w/v PMMA and 1% w/v TPS in a 1 cm-path-length cuvette showed only a trace amount of triphenylene or dibenzothiophene, indicating that topochemical factors were important for the formation of these molecules. The accumulated evidence indicates that both products were formed by in-cage, secondary photochemical reactions: 2-(phenylthio)biphenyl to triphenylene, and diphenylsulfide to dibenzothiophene.

中文翻译：

---

三苯基ulf拓扑光化学

表征了嵌入在聚甲基丙烯酸甲酯（PMMA）膜中的壬二酸三苯s（TPS）在193 nm照射下的产物。使用色谱技术（包括HPLC，GPC和GC-MS）以及UV-vis和NMR光谱法对光产物形成进行分析。检测到两种以前未报告的TPS光产物三亚苯基和二苯并噻吩；此外，辐照后的GPC和DOSY-NMR光谱分析表明TPS片段已被掺入聚合物薄膜中。在路径长度为1 cm的比色杯中辐照含有10％w / v PMMA和1％w / v TPS的乙腈溶液，仅显示痕量的三亚苯基或二苯并噻吩，表明拓扑化学因素对于这些分子的形成很重要。