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Ultrafiltration based on various polymeric membranes for recovery of spent tungsten slurry for reuse in chemical mechanical polishing process
Journal of Membrane Science ( IF 9.5 ) Pub Date : 2018-02-01 , DOI: 10.1016/j.memsci.2017.11.034
Nur Fatin Amalina Muhammad Sanusi , Mohd Hizami Mohd Yusoff , Ooi Boon Seng , Mohd Sabirin Marzuki , Ahmad Zuhairi Abdullah

Abstract Membrane separation based on ultrafiltration for the recovery of spent tungsten slurry from chemical mechanical polishing (CMP) process has been investigated. Five polymeric membranes with different molecular weight cut-off (MWCO) i.e. 10 kDa PES, 30 kDa PES, 100 kDa PES, 50 kDa PS and 50 kDa PVDF were successfully applied. Flux analysis was conducted to study the fouling phenomena and the fouling effects on membrane surface were elucidated by means of SEM and AFM analyses. Almost steady fluxes were reached after about 60 min of filtration process. Meanwhile, the membrane fouling was mainly due to the formation of cake layer on the membrane surface leading to blockage of membrane pores. On top of that, 50 kDa PS membrane showed the highest potential in filtrating and concentrating the CMP spent tungsten slurry with 92% retention of silica particles and 42% retention of tungsten. Furthermore, it also achieved the lowest mean size particle of 126 nm in the retentate which were significantly different from that of the original spent tungsten slurry.

中文翻译:

基于各种聚合物膜的超滤回收废钨浆以在化学机械抛光过程中重复使用

摘要 研究了基于超滤的膜分离用于回收化学机械抛光 (CMP) 工艺中的废钨浆。成功应用了具有不同截留分子量 (MWCO) 的五种聚合物膜,即 10 kDa PES、30 kDa PES、100 kDa PES、50 kDa PS 和 50 kDa PVDF。进行通量分析以研究结垢现象,并通过扫描电镜和原子力显微镜分析阐明结垢对膜表面的影响。在过滤过程约 60 分钟后达到几乎稳定的通量。同时,膜污染主要是由于膜表面形成滤饼层导致膜孔堵塞。最重要的是,50 kDa PS 膜在过滤和浓缩 CMP 废钨浆时表现出最高的潜力,其中二氧化硅颗粒保留率为 92%,钨保留率为 42%。此外,它还在渗余物中实现了 126 nm 的最低平均粒径,这与原始废钨浆的粒径显着不同。
更新日期:2018-02-01
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